Robert B. Laibowitz
Office: 1312 S. W. Mudd, Mail Code: 4712
Phone: +1 212-854-1266
Fax: +1 212-932-9421
Robert B. Laibowitz received Bachelor degrees in both Arts and EE and Masters degree (EE) from Columbia University and received his Ph.D. in Applied Physics from Cornell University in 1967. He worked at the IBM Research Division for many years specializing in device development and material characterization in such fields as tunnel junctions, MOS capacitors, ferroelectrics, phase change , superconductivity and a variety of dielectric measurements (including both high and low k). He worked on the Josephson Computer project during 1974-1976 at the IBM Zurich Laboratory. He joined the EE Dept at Columbia University in 2002 as a Senior Research Scientist and Adjunct Professor. His current work concerns leakage (conduction) mechanisms, trapping, barrier heights and interfaces, reliability and time dependent dielectric breakdown in low k dielectrics. He has also consulted on materials aspects of quantum computing at IBM. He has authored or co-authored about 180 peer reviewed papers and 35 patents. He is a Senior Member of the IEEE and a Fellow of the American Physical Society.